Effect of high doses of electron beam irradiation on structure and composition of ZnO films prepared by electrochemical and wet chemical depositions on solid and flexible substrates

Publication date: Available online 24 June 2019Source: Radiation Physics and ChemistryAuthor(s): N.P. Klochko, K.S. Klepikova, S.I. Petrushenko, S.V. Dukarov, V.R. Kopach, I.V. Khrypunova, D.O. Zhadan, V.M. Lyubov, A.L. KhrypunovaAbstractIn this work, we studied a destructive impact of the space electron irradiation on the promising thin film materials for optoelectronic applications, namely on pure zinc oxide (ZnO) and indium-doped (ZnO:In) thin films deposited through pulsed electrochemical deposition and Successive Ionic Layer Adsorption and Reaction technique on soda-lime glass substrates, on glass sheets covered with transparent conductive film SnO2:F (FTO), and also on flexible polyimide and polyethylene terephthalate substrates. Morphology of ZnO and ZnO:In films, both before and after their electron irradiation, and also influence of the e-irradiation treatment on the substrates were observed by scanning electron microscopy (SEM). Chemical compositions of the films were investigated by X-ray fluorescence (XRF) microanalysis. To research crystal structure we used X-ray diffraction (XRD) method. As studies have shown, the influence of electron beam irradiation in vacuum, which doses exceed the conditions of long-term space applications are manifested in the form of little ZnO and ZnO:In etching and in the slight electron-induced degradation of the film structure, which is partially offset by concomitant annealing. At the same time, such high doses of electron irradiatio...
Source: Radiation Physics and Chemistry - Category: Physics Source Type: research