Determination of copper nanoparticle size distributions with total reflection X-ray fluorescence spectroscopy
In this study, two samples were intentionally contaminated with copper in non-deoxygenated and deoxygenated ultrapure water (UPW) resulting in impurity profiles that were either atomically dispersed in a thin film or particle-like, respectively. The concentration profile of the samples immersed into deoxygenated UPW was calculated using a theoretical concentration profile representative of particles, yielding a mean particle height of 16.1 nm. However, the resulting theoretical profile suggested that a distribution of particle heights exists on the surface. The fit of the angular distribution data was further refined by minimizing the residual error of a least-squares fit employing a model with a Gaussian distribution of particle heights about the mean height. The presence of a height distribution was also confirmed with atomic force microscopy measurements.
Source: Journal of Synchrotron Radiation - Category: Physics Authors: Singh, A. Luening, K. Brennan, S. Homma, T. Kubo, N. Nowak, S.H. Pianetta, P. Tags: silicon wafer surface total reflection X-ray fluorescence Cu nanoparticle grazing-incidence X-ray fluorescence research papers Source Type: research