The phenolic acids from Oplopanax elatus Nakai stems and their potential photo-damage prevention activity

Abstract25 phenolic acids, including four new isolates, eurylophenosides A –D (1–4) and 21 known ones (5–25) were isolated and identified from the stems ofOplopanax elatus Nakai. Among the known compounds5–9,11–13,16,18–25 were isolated from the genus for the first time;17 was first obtained from the plant; and the NMR data of22 was reported here first. Meanwhile, the UVB-induced photodamage model of HaCaT cells was used to study the prevent-photodamage abilities of compounds1–2,4–8,11–13 and15–25 with a nontoxic concentration at 50  μM. Moreover, a dose-dependent experiment was conducted for active compounds at the concentration of 10, 25, and 50 µM, respectively. Consequently, pretreatment with compounds1,16,17,19,20,22,24 and25 could suppress the cell viability decreasing induced by UVB irradiation in a concentration-dependent manner. These results indicated that phenolic acids were one kind of material basis with prevent-photodamage activity ofO. elatus.Graphic abstract
Source: Journal of Natural Medicines - Category: Drugs & Pharmacology Source Type: research