[ASAP] Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer

ACS NanoDOI: 10.1021/acsnano.9b05859

Source: ACS Nano - October 16, 2019 Category: Nanotechnology Authors: Geon Gug Yang †?, Junhwan Choi‡?, Seung Keun Cha†, Gil Yong Lee†, Hyeong Min Jin§, Ho Seong Hwang†, Taeyeong Yun†, Juyeon Kang‡, Kyu Hyo Han†, Jang Hwan Kim†, Hee Jae Choi†, Sung Gap Im*‡, and Sang Ouk Kim*† Source Type: research