Growth and characterisation of zinc oxide thin films by sputtering technique

Publication date: Available online 21 August 2019Source: Materials Today: ProceedingsAuthor(s): R. Perumal, S. Thanikaikarasan, R. Saravannan, V. VijayanAbstractZinc Oxide thin films received extensive attention in recent few decades due to its attracted salient features such as anti-corrosion, anti-bacteria and low electronic conductivity. In this communication, we have reported the modified features of Zinc Oxide thin films grown on GaN substrate by RF magnetron sputtering technique. Structural analysis revealed that the deposited films having wurtzite structure. The crystallites exhibited preferential orientation along (0 0 2) plane. Structural parameters such as crystallite size, strain, dislocation density and stacking faulty probability have estimated. Elemental composition and morphological features are analyzed through scanning electron microscopy with Energy dispersive X-ray analysis. The band gap value has been estimated by optical absorption analysis and it was found to be 3.35 eV. Fourier Transform Infra Red spectroscopic measurements has been utilized to identify the various vibrational modes present in the deposited films.
Source: Materials Today: Proceedings - Category: Materials Science Source Type: research