First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina

Phys. Chem. Chem. Phys., 2018, Accepted Manuscript DOI: 10.1039/C8CP03495H, PaperGlen N. Fomengia, Michael Nolan, Simon D. Elliott Plasma-enhanced atomic layer deposition (ALD) of metal oxides is a rapidly gaining interest especially in the electronics industry because of its numerous advantages over the thermal process. However, the underlying... The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Phys. Chem. Chem. Phys. latest articles - August 18, 2018 Category: Chemistry Authors: Glen N. Fomengia Source Type: research