Self-reducing Precursors for Aluminium Metal Thin Films: Evaluation of Stable Aluminium Hydrides for Vapor Phase Aluminium Deposition

This article is licensed under aCreative Commons Attribution 3.0 Unported Licence.Niklas Huster, Rita Mullins, Michael Nolan, Anjana Devi Thin films of Al as interconnect materials and those of AlN as wide bandgap semiconductor and piezoelectric material are of great interest for microelectronic applications. For the fabrication of these... The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Dalton Trans. latest articles - April 11, 2024 Category: Chemistry Authors: Niklas Huster Source Type: research