[ASAP] Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor

Chemistry of MaterialsDOI: 10.1021/acs.chemmater.3c00525

Source: Chemistry of Materials - July 3, 2023 Category: Materials Science Authors: Chi Thang Nguyen, Eun-Hyoung Cho, Ngoc Le Trinh, Bonwook Gu, Mingyu Lee, Sunghee Lee, Jeong-Yub Lee, Youngho Kang, and Han-Bo-Ram Lee Source Type: research