[ASAP] Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange
Chemistry of MaterialsDOI: 10.1021/acs.chemmater.2c03773
Source: Chemistry of Materials - Category: Materials Science Authors: Julia D. Lenef, Andrew J. Gayle, Jaesung Jo, Kalyn M. Fuelling, Srinivas K. Yadavalli, Alondra M. Ortiz-Ortiz, Kai Sun, Rebecca L. Peterson, and Neil P. Dasgupta Source Type: research
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