Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Phys. Chem. Chem. Phys., 2021, Advance Article DOI: 10.1039/D1CP00065A, PaperAshish Rathore, Maicol Cipriani, Ching-Chung Huang, Lionel Amiaud, C éline Dablemont, Anne Lafosse, Oddur Ingólfsson, Danilo De Simone, Stefan De Gendt The electron-induced fragmentation mechanisms of two important EUV-photoresist monomers methyl isobutyrate and methacrylic acid are investigated in the film and gas-phases. To cite this article before page numbers are assigned, use the DOI form of citation above. The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Phys. Chem. Chem. Phys. latest articles - April 13, 2021 Category: Chemistry Authors: Ashish Rathore Source Type: research