Oligosilanes as Silyl Radical Precursors through Oxidative Si-Si Bond Cleavage using Redox Catalysis.

Oligosilanes as Silyl Radical Precursors through Oxidative Si-Si Bond Cleavage using Redox Catalysis.
Angew Chem Int Ed Engl. 2020 Sep 14;:
Authors: Yu X, Lübbesmeyer M, Studer A
Abstract
Oligosilanes are of great interest in the fields of organic photonics and electronics. In this communication, a highly efficient visible-light-mediated hydrosilylation of electron-deficient alkenes through cleavage of a trimethylsilyl-polysilanyl Si-Si bond is explored. These reactions smoothly occur on readily available organo(tristrimethylsilyl)silanes and other oligosilanes in the presence of an Ir III -based photo-redox catalyst under visible light irradiation. Silyl radicals are generated through single electron oxidation of the oligosilane assisted by the solvent. The introduced method exhibits broad substrate scope and high functional group tolerance with respect to the organo(tristrimethylsilyl)silane and alkene components, enabling the construction of functionalized trisilanes. In addition, this catalytic system can be also applied to highly strained bicyclo[1.1.0]butanes as silyl radical acceptors.
PMID: 32929798 [PubMed - as supplied by publisher]

Source: Angewandte Chemie - September 13, 2020 Category: Chemistry Authors: Yu X, Lübbesmeyer M, Studer A Tags: Angew Chem Int Ed Engl Source Type: research