Computational Modelling of Atomic Layer Etching of Chlorinated Germanium Surfaces by Argon

Phys. Chem. Chem. Phys., 2019, Accepted Manuscript DOI: 10.1039/C9CP00125E, CommunicationShenli Zhang, Yihan Huang, Gulcin Tetiker, Saravanapriyan Sriraman, Alex Paterson, Roland Faller The atomic layer etching of chlorinated germanium surfaces under argon bombardment was simulated using molecular dynamics with a newly fitted Tersoff potential. The chlorination energy determines the threshold energy for... The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Phys. Chem. Chem. Phys. latest articles - February 21, 2019 Category: Chemistry Authors: Shenli Zhang Source Type: research