[ASAP] CFD Simulation of the Dosing Behavior within the Atomic Layer Deposition Feeding System
Industrial& Engineering Chemistry ResearchDOI: 10.1021/acs.iecr.3c01151
Source: Industrial and Engineering Chemical Research - Category: Chemistry Authors: Yuchen Yuan, Huihui Ping, Dennis T. Lee, Peter Corkery, Zhen Zhang, Cui Liu, Shuang-mei Xue, Liwei Zhuang, and Michael Tsapatsis Source Type: research
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