[ASAP] 100 μm-Cavity GaN-Based Edge Emitting Laser Diodes by the Automatic Cleavage Technique Using GaN-on-Si Epitaxial Lateral Overgrowth
Crystal Growth& DesignDOI: 10.1021/acs.cgd.3c00070
Source: Crystal Growth and Design - Category: Chemistry Authors: Yoshinobu Kawaguchi, Kentaro Murakawa, Motohisa Usagawa, Yuuta Aoki, Kazuma Takeuchi, and Takeshi Kamikawa Source Type: research
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