[ASAP] Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition
ACS Applied Materials& InterfacesDOI: 10.1021/acsami.0c22121
Source: ACS Applied Materials and Interfaces - Category: Materials Science Authors: Philip Klement, Daniel Anders, Lukas Gu ̈mbel, Michele Bastianello, Fabian Michel, Jörg Schörmann, Matthias T. Elm, Christian Heiliger, and Sangam Chatterjee Source Type: research
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