[ASAP] Localized and Programmable Chemical Vapor Deposition Using an Electrically Charged and Guided Molecular Flux

ACS NanoDOI: 10.1021/acsnano.0c03726

Source: ACS Nano - September 25, 2020 Category: Nanotechnology Authors: Johannes Reiprich, Nishchay A. Isaac, Leslie Schlag, Thomas Kups, Marcus Hopfeld, Gernot Ecke, Thomas Stauden, Jo ̈rg Pezoldt, and Heiko O. Jacobs Source Type: research