Exceptional mechano-electronic properties in the HfN2 monolayer: a promising candidate in low-power flexible electronics, memory devices and photocatalysis

Phys. Chem. Chem. Phys., 2020, Advance Article DOI: 10.1039/D0CP02999H, PaperManish Kumar Mohanta, I. S. Fathima, Abir De Sarkar The response of the electronic properties of the HfN2 monolayer to external perturbation such as strain and electric fields has been investigated using density functional theory calculations for its device-based applications and photocatalysis. To cite this article before page numbers are assigned, use the DOI form of citation above. The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Phys. Chem. Chem. Phys. latest articles - September 16, 2020 Category: Chemistry Authors: Manish Kumar Mohanta Source Type: research