Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing

Publication date: December 2020Source: Tribology International, Volume 152Author(s): Chong Luo, Yi Xu, Nengyuan Zeng, Tengda Ma, Chenwei Wang, Yuling Liu
Source: Tribology International - Category: Materials Science Source Type: research