[ASAP] Bottom-Up Masking of Si/Ge Surfaces and Nanowire Heterostructures < italic toggle="yes" > via < /italic > Surface-Initiated Polymerization and Selective Etching

ACS NanoDOI: 10.1021/acsnano.9b04363

Source: ACS Nano - December 26, 2019 Category: Nanotechnology Authors: Amar T. Mohabir †, Gozde Tutuncuoglu†, Trent Weiss†, Eric M. Vogel‡, and Michael A. Filler*† Source Type: research