Soft X-ray varied-line-spacing gratings fabricated by   near-field holography using an electron beam lithography-written phase mask

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52   mm × 30   mm and a central line density greater than 3000 lines   mm − 1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL – NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.
Source: Journal of Synchrotron Radiation - Category: Physics Authors: Tags: near-field holography electron beam lithography fabrication soft X-ray varied-line-spacing grating spectrometer research papers Source Type: research

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