Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory

We examined the composition and by‐products of the photoresists according to descriptions published in the literature and patents; the main compositions assessed were propylene glycol methyl ether acetate (PGMEA), novol ac resin, photoactive compound, phenol, cresol, benzene, toluene, and xylene. Reference concentrations for each compound were reassessed and updated if necessary. Calculated hazard quotients were greater than 1 for benzene, phenol, xylene, and PGMEA, indicating that they have the potential for expos ures that exceed reference levels. The information from our health risk assessment suggests that benzene and phenol have a higher level of risk than is currently acknowledged. Undertaking our form of risk assessment in the workplace design phase could identify compounds of major concern, allow for t he early implementation of control measures and monitoring strategies, and thereby reduce the level of exposure to health risks that workers face throughout their career.
Source: Risk Analysis - Category: International Medicine & Public Health Authors: Tags: Original Research Article Source Type: research