In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

Aberration adjustment is of great importance in the lithographic process of integrated circuit manufacturing due to the pressure variance, lens thermal effects, overlay correction, and 3D mask effects. With the objective of removing the crosstalk effect, as well as reducing computational complexity ...

Source: Applied Optics - May 18, 2019 Category: Physics Authors: Zhiyong Yang Xiuguo Chen Hao Jiang Shiyuan Liu Source Type: research