Effect of energy per atom (E/n) on the Ar gas cluster ion beam (Ar-GCIB) and O2+ cosputter process

Analyst, 2019, Advance Article DOI: 10.1039/C8AN02452A, PaperShin-Kung Wang, Hsun-Yun Chang, Yi-Hsuan Chu, Wei-Lun Kao, Chen-Yi Wu, Yi-Wei Lee, Yun-Wen You, Kuo-Jui Chu, Shu-Hang Hung, Jing-Jong Shyue With optimization, GCIB-O2+ cosputter is a promising technique for preserving molecular structures during ion sputtering and successfully profiled soft materials. To cite this article before page numbers are assigned, use the DOI form of citation above. The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Analyst latest articles - April 10, 2019 Category: Chemistry Authors: Shin-Kung Wang Source Type: research