Multi-Electron Reduction of Wells-Dawson Polyoxometalate Films onto Metallic, Semiconducting and Dielectric Substrates

Phys. Chem. Chem. Phys., 2018, Accepted Manuscript DOI: 10.1039/C8CP07101B, PaperAntonios M. Douvas, Dimitris Tsikritzis, Charalampos Tselios, Ali Haider, Ali S. Mougharbel, Ulrich Kortz, Hiskia Anastasia, Athanassios G. G Coutsolelos, Leonidas C. Palilis, maria vasilopoulou, Stella Kennou, Panagiotis Argitis The investigation of conditions allowing multi-electron reduction and reoxidation of polyoxometalate (POM) films onto solid substrates is considered an issue of critical importance for their successful incorporation in electronic devices,... The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Phys. Chem. Chem. Phys. latest articles - December 4, 2018 Category: Chemistry Authors: Antonios M. Douvas Source Type: research