Nano-confinement of block copolymers in high accuracy topographical guiding patterns: Modelling the emergence of defectivity due to incommensurability

Soft Matter, 2018, Accepted Manuscript DOI: 10.1039/C8SM01045E, PaperSteven Gottlieb, Dimitrios Kazazis, Iacopo Mochi, Laura Evangelio, Marta Fernandez-Regulez, Yasin Ekinci, Francesc Perez-Murano Extreme ultraviolet interference lithography (EUV-IL) is used to manufacture topographical guiding patterns to direct the self-assembly of block copolymers. High-accuracy silicon oxide-like patterns with trenches ranging from 68 nm to... The content of this RSS Feed (c) The Royal Society of Chemistry

Source: RSC - Soft Matter latest articles - July 5, 2018 Category: Chemistry Authors: Steven Gottlieb Source Type: research